| RAVE, LLC is a global supplier of nanomachining solutions to the photomask marketplace as a method of repair of advanced photomasks. Nanomachining technology as applied to photomask repair is the precise and accurate removal of defects in quartz, chrome, MoSi, and various exotic materials.Since its inception, RAVE has become recognized as the industry leader for Alternating and Embedded Phase shift mask repair. RAVE's emphasis has been on materials that provide significant challenges for the current industry standard repair techniques; specifically, quartz bumps on alternating phase shift masks, trimming of carbon patches, and repairs within tight lines and spaces.RAVE's newest product, its nm 650, supports mask repair in support of next generation 65 nanometer device design node
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